The Regional Conference on Patent Litigation in New York: In Search of Best Practices for Patent Litigation Case Management Post-AIA

Thursday, May 2, 2013 - 8:00am to 6:00pm

New York City, NY
Cardozo School of Law

The Sedona Conference’s Working Group 10 (WG10) is just beginning its dialogue in search of best practices in patent litigation in the wake of the profound changes mandated by the America Invents Act (AIA) and the Patent Pilot Program.

This conference will give you the chance to participate in – and contribute to – the initial phase of this very important discussion. By taking part in Sedona’s acclaimed dialogue-based approach, you will join leading judges, practitioners, and regulators in search of a non-partisan consensus that will help shape patent litigation practice in the post-AIA landscape.

Leora Ben-Ami of Kirkland & Ellis and Ronald J. Schutz of Robin, Kaplan, Miller & Ciresi serve as conference co-chairs. They have pulled together a stellar faculty to lead the dialogue, including leading judges, patent practitioners, and regulators in the New York area.

Expert panels will lead dialogue in the following topic areas:

  • Early Evaluation of Damage Exposure
  • Markman Hearings and Claim Construction
  • Contested Parallel Proceedings Before the USPTO
  • ITC: Domestic Industry Requirement and Relief Available
  • Patent Litigation Case Management

The Sedona Conference® will be applying for 375 minutes of MCLE accreditation.

The conference will be held at the Jacob Burns Moot Court Room of the Cardozo School of Law, located at 55 Fifth Avenue in Manhattan.

Space is limited to 100 registrants in order to provide maximum interaction between all participants. Seats are granted on a first-come, first-served basis.

This conference is one in a series of one-day Regional Conferences on Patent Litigation presented by The Sedona Conference® InstituteSM across the country. Another will be held at the offices of Sterne, Kessler, Goldstein & Fox, P.L.L.C in Washington, DC on May 9. WGS members will receive a $100 discount when registering for any of the regional patent case management conferences.